Anomalous ion channeling in AlInN/GaN bilayers: determination of the strain state.
نویسندگان
چکیده
Monte Carlo simulations of anomalous ion channeling in near-lattice-matched AlInN/GaN bilayers allow an accurate determination of the strain state of AlInN by Rutherford backscattering or channeling. Although these strain estimates agree well with x-ray diffraction (XRD) results, XRD composition estimates are shown to have limited accuracy, due to a possible deviation from Vegard's law, which we quantify for this alloy. As the InN fraction increases from 13% to 19%, the strain in AlInN films changes from tensile to compressive with lattice matching predicted to occur at [InN] = 17.1%.
منابع مشابه
Breakdown of anomalous channeling with ion energy for accurate strain determination in GaN-based heterostructures
determination in GaN-based heterostructures A. Redondo-Cubero, K. Lorenz, R. Gago, N. Franco, S. Fernández-Garrido, P. J. M. Smulders, E. Muñoz, E. Calleja, I. M. Watson, and E. Alves Instituto de Sistemas Optoelectrónicos y Microtecnología, Universidad Politécnica de Madrid, E-28040 Madrid, Spain Centro de Micro-Análisis de Materiales, Universidad Autónoma de Madrid, E-28049 Madrid, Spain Inst...
متن کاملCharacterization and analysis of electrical trap related effects on the reliability of AlInN/GaN HEMTs
Article history: Received 22 May 2015 Received in revised form 12 June 2015 Accepted 18 June 2015 Available online xxxx This paper shows the influence of pre-existing electrical traps on the reliability of AlInN/GaN HEMTs by using simple methods. So, a kink effect has been highlighted by studying the impact of the illumination and the bias conditions on the electrical characteristics of the AlI...
متن کاملStructural properties of Al-rich AlInN grown on c-plane GaN substrate by metal-organic chemical vapor deposition
The attractive prospect for AlInN/GaN-based devices for high electron mobility transistors with advanced structure relies on high-quality AlInN epilayer. In this work, we demonstrate the growth of high-quality Al-rich AlInN films deposited on c-plane GaN substrate by metal-organic chemical vapor deposition. X-ray diffraction, scanning electron microscopy, and scanning transmission electron micr...
متن کاملLarge Optical Gain AlInN-Delta-GaN Quantum Well for Deep Ultraviolet Emitters
The optical gain and spontaneous emission characteristics of low In-content AlInN-delta-GaN quantum wells (QWs) are analyzed for deep ultraviolet (UV) light emitting diodes (LEDs) and lasers. Our analysis shows a large increase in the dominant transverse electric (TE) polarized spontaneous emission rate and optical gain. The remarkable enhancements in TE-polarized optical gain and spontaneous e...
متن کاملMetalorganic vapor phase epitaxy and characterizations of nearly-lattice-matched AlInN alloys on GaN/sapphire templates and free-standing GaN substrates
The epitaxy optimization studies of high-quality n-type AlInN alloys with different indium contents grown on two types of substrates by metalorganic vapor phase epitaxy (MOVPE) were carried out. The effect of growth pressure and V/III molar ratio on growth rate, indium content, and surface morphology of these MOVPE-grown AlInN thin films were examined. The surface morphologies of the samples we...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
- Physical review letters
دوره 97 8 شماره
صفحات -
تاریخ انتشار 2006